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JEOL JBX-6300FS Electron Beam Lithography System


Electron beam lithography uses a finely focused beam of electrons to define patterns onto a polymer-coated wafer. This "resist" pattern can then be used as a stencil to define metal lines or as a protective mask to etch features into a semiconductor wafer. Specifically, the JEOL JBX 6300 lithography system uses a high-brightness field emission electron source, a 100 keV acceleration potential, a 25 Mega-Hertz deflection system and magnetic lenses to define a beam diameter as small as 2 nm and patterns in resist as small as 8 nm. The laser-controlled stage is capable of loading 1 cm square compound semiconductor chips, up to 200 mm (8 inch) diameter silicon substrates. Upcoming nano-device research will include: nano-apertures for near-field optics, photonic crystals, novel laser structures, quantum devices to study transport in compound semiconductors, nano-CMOS. nano-magnetic memory and x-ray zone plates.

Contact Information

Rich Tiberio

Research Examples

Exposure: ZEP resist, 100 kV JEOL e-beam, 40 nm grating with ~ 8 nm lines. Image: low voltage SEM image of polymer resist at 100 kX mag. Image courtesy of Tiberio (Stanford).


Photonic crystal crossbeam structures in GaAs. Fabrication: ZEP resist 100KV JEOL ebeam, followed by PlasmaQuest chlorine etch and HF sacrificial layer (AlGaAs) removal. Image: Low voltage SEM image. Scale bars 200, 10 and 2 microns. Sonia Buckley (Vuckovic group).

Getting Started

In order to become a qualified user on the tool, you need to follow each of these steps in the order as listed below. Note that if you decide to skip some of these steps, we will delay access to the tool.

  • complete the process to become lab member of SNSF
  • The training is not a primer to fabrication. We expect that you have an adequate understanding of nanofabrication princples and your process needs.
  • The JEOL 6300FS is located within the Nanopatterning Cleanroom at the basement of the Nanoscale Science and Engineering Building. In order to get access to the JEOL e-beam, you must follow the procedures for gaining access the the Nanopatterning Cleanroom.
  • send an email to Provide a short description of your research project as well as a more detailed process flow for using the JEOL e-beam (use JEOL 6300FS New User Process Screening).
  • upon review of the project, Rich will contact you for further discussion and/or scheduling training