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Operations During COVID-19

EBL: JEOL JBX-6300FS Electron Beam Lithography System

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Overview

Electron beam lithography uses a finely focused beam of electrons to define patterns onto a polymer-coated wafer. This "resist" pattern can then be used as a stencil to define metal lines or as a protective mask to etch features into a semiconductor wafer. Specifically, the JEOL JBX 6300 lithography system uses a high-brightness field emission electron source, a 100 keV acceleration potential, a 25 Mega-Hertz deflection system and magnetic lenses to define a beam diameter as small as 2 nm and patterns in resist as small as 8 nm. The laser-controlled stage is capable of loading 1 cm square compound semiconductor chips, up to 200 mm (8 inch) diameter silicon substrates. Upcoming nano-device research will include: nano-apertures for near-field optics, photonic crystals, novel laser structures, quantum devices to study transport in compound semiconductors, nano-CMOS. nano-magnetic memory and x-ray zone plates.

Contact Information

nano-ebeam-staff@lists.stanford.edu
Rich Tiberio
Stanley Lin

Getting Started and Training Information

Please see the Getting Started and Training Information section on the EBL webpage to become a qualified user of the JEOL 6300 EBL system.