IBL: Raith Velion S Ion Beam Lithography System
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Overview
The Velion S features:
- Unique multi-ion-species FIB technology (IonSelect) with the AuGeSi LMAIS
- Vertically mounted FIB column and horizontal 4-inch laser interferometer stage
- Large-area FIB patterning capabilities on a true lithography platform - IBL
- Automated, stable nanofabrication over several days
- Ga-free TEM sample preparation
- Ion microscopy and imaging with light ions
- Easy, fast and reliable ion imaging, 3D sample reconstruction without stage tilt
- Sample analysis & in-situ process monitoring enabled by tailored SEM column
Additional details will be added to this section soon.
Installation Timeline (Subject to Change)
| March 20, 2025 | Raith Velion S IBL Delivery |
| March 24 - April 18, 2025 | Velion Installation |
| April 22 - 24, 2025 | Staff and Advanced User Training |
| April 25 - May 16, 2025 | Staff Testing and Additional Setup |
| May 19, 2025 (Anticipated) | Begin New User Trainings |
Contact Information
nano-ebeam-staff@lists.stanford.edu
Rich Tiberio
Stanley Lin
Doc Daugherty