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Student working with staff member at the JEOL electron beam lithography tool.


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The Nanofabrication facilities feature two 2000 square feet class 100 cleanrooms located within the Spilker Building. Advanced electron beam lithography, SEM, physical vapor deposition and ion beam milling are examples of the capabilities available for nanofabrication.

The Spilker Building is home to two class 100 cleanrooms:

Cleanroom FacilitiesLocations
Nanopatterning CleanroomSpilker Basement, Room 006 Suite
Flexible CleanroomSpilker 1st floor, Room 131 Suite

A range of equipment and capabilities exists in each of the cleanrooms. The following lists the tools available:

EBL: Raith EBPG 5200+Nanopatterning Cleanroom650-723-8586
EBL: Raith VOYAGERNanopatterning Cleanroom650-723-8586
SEM: FEI Nova SEMNanopatterning Cleanroom650-723-8587
Litho: ML3 Direct WriteFlexible Cleanroom 
Deposition: KJL EvaporatorsNanopatterning Cleanroom 
Deposition: Oerlikon Univex SputterFlexible Cleanroom 
Deposition: Big Evaporator - Service OnlyFlexible Cleanroom 
Deposition: Small Evaporator - Service OnlyFlexible Cleanroom 
Etch: Oxford PlasmaPro 80 RIENanopatterning Cleanroom 
Etch: Intlvac Ion MillFlexible Cleanroom 
Profilometer: Dektak XT-S Stylus ProfilerNanopatterning Cleanroom 
Profilometer: KLA Tencor Alpha Step D-500Flexible Cleanroom 
Microscopy: Keyence VK‐X 3D Laser ConfocalNanopatterning Cleanroom 
Microscopy: Nikon LV100NDFlexible Cleanroom; Nanopatterning Cleanroom 
Microscopy: EVO Cam IIFlexible Cleanroom; Nanopatterning Cleanroom; McCullough 100 
Asher: March Instruments PX-250 Plasma AsherFlexible Cleanroom 
UV: American Ultraviolet Cool Cure UV Exposure ChamberFlexible Cleanroom 
Oven: VST High Vacuum OvenFlexible Cleanroom 
Wet BenchesNanopatterning Cleanroom 
General EquipmentNanopatterning Cleanroom 
Westbond Wire BonderMcCullough 101 
3D PrinterMoore 184 
Microfabrication ShopFlexible Cleanroom