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Wet Benches (Nanopatterning Cleanroom)

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Overview

The Nanopatterning Cleanroom has four wet benches each dedicated to specific chemical processing applications. The spinner bench features several hot plates that support e-beam lithography, including a custom triple resist hotplate designed and built by Tom Carver that has a Teflon coated precision flat surface with uniform and accurate surface temperatures. The solvent bench opposite the spinner bench supports various cleaning and liftoff processes and features a sonicator bath. The base and acid benches are used for chemical processing with alkaline and acidic substances respectively. The Nanopatterning Cleanroom provides users with a variety of general use chemicals, and also supports the use of external, user-supplied chemicals upon staff approval.

There are three kinds of hot plates available:

  • Torrey Pines HP40A hotplates for general sample heating and resist baking;
  • SCILOGEX SCI280 hotplate stirrer for heating chemical baths (Remover PG, etc.);
  • Triple Hotplate: This custom triple resist hotplate was designed and built by Tom Carver. It is for baking resist, PMMA, e-beam resist, SU-8, and other spin-on polymers. The precision flat surface is coated with Teflon. The surface temperature is very uniform and accurate. It is not to be used at higher than 220C. Aluminum sheet metal squares are available for baking polymers that are not easily removed with solvents once baked.

Getting Started and Training Information

In order to become a qualified user of the NPC Wet Benches, you need to follow each of these steps in the order as listed here:

  1. Complete the process to become a lab member of SNSF and follow the instructions to activate a Badger account.
  2. Read the Wet Bench Bay Standard Operating Procedures.
  3. Pass (100%) the Wet Bench Safety Quiz that reviews wet bench safety and procedures.
  4. Complete the Wet Bench Bay New User Intake Form (second part of the quiz above).
  5. Complete the Nanopatterning Cleanroom intake process (Getting Started and Training Information for the Nanopatterning Cleanroom). Steps 1-4 above is part of the process.
  6. Sign up for an in-person wet bench training session. The sign up sheet will be sent to you after you complete the Nanopatterning Cleanroom intake process.
  7. After completing the training session, you will be qualified to use the four wet benches.
  8. More specific wet bench processing training can be requested by emailing staff.

Please note that subsequent training may be required after the initial Wet Bench Training depending on what processing you plan on doing. Before you start any new processes after completing the initial Wet Bench Bay Training, contact staff at nano-snpcleanroom-staff@lists.stanford.edu to check if further guidance or training may be required.