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Operations During COVID-19

Etch: Intlvac Ion Beam Mill Etcher

Overview

The Intlvac Nanoquest Research Ion Beam Milling System is a Versatile R&D platform. The ion beam processing is a controllable thin film etching technique with independent control of ion energy, ion current density, and incidence angle. Designed as a general purpose R&D tool, the Nanoquest I is capable of performing processes ranging from a simple etch to multi-angle, utilizing substrate rotation and substrate offset to achieve a superior etch. The Nanoquest System combines a 4 inch water-cooled, rotating stage, a Kaufman ion source, an easily accessible stainless steel vacuum chamber with Turbo Molecular pumping.

Research Examples

Fabrication of 1 um Hall bars of HgTe quantum wells to study QSHE; Ebeam Lithography: Raith 150 at SNF; Etching: Intlvac Ion Mill using a Ti mask; Characterization: FEI Nova SEM and Park XE-70 AFM. Credit: Reyes Calvo (Goldhaber-Gordon Group, Stanford)

Getting Started and Training Information

In order to become a qualified user of the Intlvac Ion Mill, you need to follow each of these steps in the order as listed here:

  1. Complete the process to become a lab member of SNSF and follow the instructions to activate a Badger account.
  2. Complete the SNSF COVID-19 Authorization protocol and receive notification of authorization.
  3. Complete the process to become a Flexible Cleanroom user.
  4. Contact nano-ionmill-staff@lists.stanford.edu to get trained and qualified on the Ion Mill.